製品名:DPMA

IUPAC Name:1-[(1-methoxypropan-2-yl)oxy]propan-2-yl acetate

CAS番号:88917-22-0
分子式:C9H18O4
純度:95%+
カタログ番号:CM1043815
分子量:190.24

包装単位 有効在庫 価格(USD) 数量

研究開発用専用.

問い合わせフォーム

   refresh    

製品詳細

CAS番号:88917-22-0
分子式:C9H18O4
融点:-
SMILESコード:CC(COC)OCC(C)OC(=O)C
密度:0.97 g/cm3
カタログ番号:CM1043815
分子量:190.24
沸点:
MDL番号:
保管方法:

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.